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What are the characteristics of sputtered films?
Published on:
2023-06-06 11:15
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Good film thickness controllability and repeatability, whether the
thickness of the plated film layer can be controlled at a predetermined value, is called film thickness controllability. The required layer thickness is reproduced in multiple repeatability, which is called film thickness repeatability. Since the discharge current and target current of the vacuum sputtering coating can be controlled separately. The film thickness can be controlled by controlling the target current. Therefore, the film thickness controllability of sputtering coating is more important, and the film of predetermined thickness can be reliably plated. Furthermore, sputter coatings can achieve uniform thickness on larger surfaces.
The adhesion between the film and the substrate is strong, and the energy of the sputtering atom is
1~2 orders of magnitude higher than that of the evaporated atom. High-energy sputtered atoms deposited on the substrate perform much higher energy conversion than evaporated atoms, generating higher heat and enhancing the adhesion of the sputtered atoms to the substrate. And some high-energy sputtering atoms produce different degrees of injection phenomenon, forming a pseudo-diffusion layer on the substrate in which the sputtered atoms and the substrate atoms are mutually dissolved. Moreover, the substrate is always cleaned and activated in the plasma region during the film-forming process, removing sputtering atoms with weak adhesion and purifying and activating the substrate surface. Therefore, the adhesion between the sputtering film and the substrate is strong, the purity of the film layer is good, and the purity is good, because there is
no crucible member in the evaporation membrane device in the sputtering membrane device. Therefore, the sputtering film layer will not be mixed with the composition of the crucible heater material.
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